Wykaz publikacji wybranego autora

Edward Walasek, dr

Wydział Inżynierii Materiałowej i Ceramiki
WIMiC-ktcmo, *Katedra Technologii Ceramiki i Materiałów Ogniotrwałych

Identyfikatory Autora	Informacje o Autorze w systemach zewnętrznych
ORCID: brak ResearcherID: brak Scopus: brak	OPI Nauka Polska

Identyfikatory Autora

Informacje o Autorze w systemach zewnętrznych

ORCID: brak

ResearcherID: brak

Scopus: brak

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1

Amorphous hydrogenated silicon-nitrogen $(a-Si_{1-x}N_{x}:H)$ films deposited by PECVD
Amorphous hydrogenated silicon-nitrogen $(a-Si_{1-x}N_{x}:H)$ films deposited by PECVD / Stanisława A. JONAS, Tomasz J. STAPIŃSKI, Edward P. WALASEK, Mariusz K. Chrabąszcz // Journal of Wide Bandgap Materials ; ISSN 1524-511X. — 2001 vol. 9 no. 1–2, s. 83–92. — Bibliogr. s. 92, Abstr.

2

Chemical vapour infiltration of SiC in porous graphite materials
Chemical vapour infiltration of SiC in porous graphite materials / E. WALASEK, S. JONAS, T. STAPIŃSKI, S. KLUSKA, A. CZYŻEWSKA // Key Engineering Materials ; ISSN 1013-9826. — 2002 vols. 206–213, s. 567–570. — Bibliogr. s. 570, Abstr.. — ECRS seventh : Euro Ceramics VII : proceedings of the 7th conference & exhibition of the European Ceramic Society : Brugge, Belgium, September 9–13, 2001. Pt. 1 Sessions P1, P2, P3, G1. — Switzerland [et al.] : Trans Tech Publications, 2002

3

Growth and properties of hydrogenated $C_{x}N_{y}$ layers
Growth and properties of hydrogenated $C_{x}N_{y}$ layers / S. JONAS, E. WALASEK, I. HOŁYST, T. STAPIŃSKI, A. CZYŻEWSKA // W: The sixth conference and exhibition of the European Ceramic Society : 20–24 June 1999 Brighton : abstracts, Vol. 1. — London : IOM Communications, 1999. — (British Ceramic Proceedings ; ISSN 0268-4373 ; no. 60). — ISBN: 978-1861250933 ; ISBN10: 1861250932. — S. 235–236. — Bibliogr. s. 236, Abstr.

4

Influence of $SiC$ infiltration on some properties of porous carbon materials
Influence of $SiC$ infiltration on some properties of porous carbon materials / S. KLUSKA, S. JONAS, E. WALASEK, T. STAPIŃSKI, M. PYZALSKI // Journal of the European Ceramic Society ; ISSN 0955-2219. — Tytuł poprz.: International Journal of High Technology Ceramics. — 2003 vol. 23 iss. 9, s. 1509–1515. — Bibliogr. s. 1515, Abstr.. — tekst: https://www-1sciencedirect-1com-10000271c01b0.wbg2.bg.agh.edu.pl/science/article/pii/S0955221902003588/pdfft?md5=af34f02c4a4540b7fdc096bc1cd64f9b&pid=1-s2.0-S0955221902003588-main.pdf

5

Optical and structural properties of amorphous silicon-carbon films for optoelectronic applications
Optical and structural properties of amorphous silicon-carbon films for optoelectronic applications / T. STAPIŃSKI, B. SWATOWSKA, S. KLUSKA, E. WALASEK // Applied Surface Science ; ISSN 0169-4332. — Tytuł poprz.: Applications of Surface Science. — 2004 vol. 238 iss. 1–4, s. 367–374. — Bibliogr. s. 373–374, Abstr.. — Publikacja dostępna online od: 2004-08-18. — APHYS-2003 : 1st international neeting on Applied Physics : Badajoz, Spain, October 15-18, 2003. — tekst: https://www-1sciencedirect-1com-100002778026d.wbg2.bg.agh.edu.pl/science/article/pii/S0169433204008414/pdfft?md5=42ee9fa45c15384fe1c41fb6b22d0583&pid=1-s2.0-S0169433204008414-main.pdf

6

Preparation and properties of $a-C:H$ and $a-C:N:H$ layers
Preparation and properties of $a-C:H$ and $a-C:N:H$ layers / S. JONAS, T. STAPIŃSKI, E. WALASEK, A. Hilbig, I. ŁAGOSZ, G. KRUPA // Key Engineering Materials ; ISSN 1013-9826. — 2002 vols. 206–213, s. 571–574. — Bibliogr. s. 574. — ECRS seventh : Euro Ceramics VII : proceedings of the 7th conference & exhibition of the European Ceramic Society : Brugge, Belgium, September 9–13, 2001. Pt. 1 Sessions P1, P2, P3, G1. — Switzerland [et al.] : Trans Tech Publications, 2002. — ISBN 0-87849-882-6

7

Properties of DLC and a-C:N:H films grown by PECVD and MWCVD techniques
Properties of DLC and a-C:N:H films grown by PECVD and MWCVD techniques / S. JONAS, T. STAPIŃSKI, E. WALASEK // W: Surface Engineering: in materials science I : proceedings of a symposium by the TMS Surface Modification & Coatings Technology Committee (SMC) and the Materials Processing and Manufacturing Division (MPMD), held during the 2000 TMS Annual Meeting : Nashville, Tennessee March 12–16, 2000 / ed. Sudipta Seal [et al.]. — Warrendale : The Minerals, Metals & Materials Society, 2000. — (A Publication of TMS). — ISBN10: 0-87339-471-2. — S. 347–355. — Bibliogr. s. 355

8

UHV plasma enhanced CVD system for preparation of new generation amorphous silicon based efficient solar cells
UHV plasma enhanced CVD system for preparation of new generation amorphous silicon based efficient solar cells / S. JONAS, P. Rava, T. STAPIŃSKI, E. WALASEK // Opto-Electronics Review / Stowarzyszenie Elektryków Polskich, Wojskowa Akademia Techniczna. Warszawa ; ISSN 1230-3402. — 2001 vol. 9 iss. 1, s. 91–95. — Bibliogr. s. 94–95